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The Fifth International Congress on X-Ray Optics and Microanalysis was organized by the Institute of Applied Physics at Tübingen University in Western Germany from September 9th through 14th, 1968. Since 1956, when the First Conference was arranged in Cambridge, England by one of the pioneers in this field, V. E. CossLETT, the experts in the fields of X-Ray Optics and Microanalysis have met every third year to exchange their scientific experiences. Later meetings were held at Uppsala, Sweden in 1959, at Stanford, California in 1962, and at Orsay, Francein 1965. The participants in the 1968 Conference came from the following countries: Germany 140, France 60, Great Britain 55, USA 20, Netherlands 16, Switzerland 12, Austria 9, Sweden 7, Belgium 6, Japan 5, Italy 4, two each from Israel, Yugoslavia, Canada, Norway, Hungary and one each from Argentine, Poland, South Africa. As at the latest congress in Paris the following central topics were treated: General problems of X-ray optics, physical bases of electron beam microanalysis, quantitative problems of X-ray microanalysis, instrumentation, microdiffraction, applications to metal lurgy, mineralogy, and biology. An exhibition showing some of the most modern instruments formed an important part of the conference. The Springer-Verlag, Heidelberg, deserves thanks for the careful and speedy work they have performed in printing these conference proceedings. We are further indebted to all contributors of this volume for their kind cooperation. Tübingen, August 1969 G. MöLLENSTEDT and K. H.
This special volume of Advances in Imaging and Electron Physics details the current theory, experiments, and applications of neutron and x-ray optics and microscopy for an international readership across varying backgrounds and disciplines. Edited by Dr. Ted Cremer, these volumes attempt to provide rapid assimilation of the presented topics that include neutron and x-ray scatter, refraction, diffraction, and reflection and their potential application. - Contributions from leading authorities - Informs and updates on all the latest developments in the field
Due to its enormous sensitivity and ease of use, mass spectrometry has grown into the analytical tool of choice in most industries and areas of research. This unique reference provides an extensive library of methods used in mass spectrometry, covering applications of mass spectrometry in fields as diverse as drug discovery, environmental science, forensic science, clinical analysis, polymers, oil composition, doping, cellular research, semiconductor, ceramics, metals and alloys, and homeland security. The book provides the reader with a protocol for the technique described (including sampling methods) and explains why to use a particular method and not others. Essential for MS specialists working in industrial, environmental, and clinical fields.
Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Contributions from leading international scholars and industry experts Discusses hot topic areas and presents current and future research trends Invaluable reference and guide for physicists, engineers and mathematicians
First multi-year cumulation covers six years: 1965-70.
The first edition of this book was widely praised as an excellent introduction to electron microscopy for materials scientists, physicists, earth and biological scientists. This completely revised new edition contains expanded coverage of existing topics and much new material. The author presents the subject of electron microscopy in a readable way, open both to those inexperienced in the technique, and also to practising electron microscopists. The coverage has been brought completely up to date, whilst retaining descriptions of early classic techniques. Currently live topics such as computer control of microscopes, energy-filtered imaging, cryo- and environmental microscopy, digital imaging, and high resolution scanning and transmission microscopy are all described. The highly praised case studies of the first edition have been expanded to include some interesting new examples. This indispensable guide to electron microscopy, written by an author with thirty years practical experience, will be invaluable to new and experienced electron microscopists in any area of science and technology.