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Analysis of the New Metals: Titanium, Zirconium, Hafnium, Niobium, Tantalum, Tungsten and their Alloys focuses on methods for the analysis of titanium, zirconium, hafnium, niobium, tantalum, tungsten, and their alloys. Emphasis is on the procedures used in Imperial Metal Industries (Kynoch) Limited's laboratories for the analysis of these metals. These procedures include the oxide-resin procedure, solution procedure, and the point-to-plane spectrographic procedure. Comprised of six chapters, this book begins with an overview of special procedures for obtaining representative samples, including the use of titanium or zirconium sponge (Kroll process) as well as titanium granules (ICI sodium process). Subsequent chapters discuss the identification of titanium and its alloys such as aluminum, boron, calcium, carbon, and copper by means of the point-to-plane spectrographic procedure, a Fuess metal spectroscope, and chemical spot-tests; spectroscopic analysis of zirconium, zirconium alloys, and ionide-refined hafnium; and spectroscopic analysis of niobium, tantalum, tungsten, and their alloys. This monograph will be useful for undergraduate students, educators, practitioners, and researchers in metallurgy.
Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face
THE CHEMICAL PROCESS industry presents a complex set of materials selection challenges. Conducting corrosion testing of candidate materials under simulated or actual service conditions is widely used in the process of materials selection. ASTM G 4, Guide for Conducting Corrosion Tests in Field Applications and G 31, Practice for Laboratory Immersion Corrosion Testing of Metals, and NACE Standard TM-01-69, Laboratory Corrosion Testing of Metals are the general guides for conducting corrosion tests. While these standards can be very useful in making a preliminary list of the best candidate materials, they are designed primarily for the more common metals and alloys such as steel, aluminum alloys, and copper alloys. Certain portions of these procedures, e.g., cleaning methods, are not applicable to zirconium, hafnium, and their alloys. Although ASTM G 2 is designated specifically for zirconium, hafnium, and their alloys, it is a specific practice used in the nuclear industry. Therefore, a tailored practice for conducting corrosion specimen tests on zirconium, hafnium, and their alloys in chemical environments is needed. The use of test standards that have not been modified for zirconium or hafnium may lead to erroneous or invalid results.