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This volume was designed to capture a wide cross-section of contemporary international diffusion research by presenting advances in both experimental aspects and modelling of diffusion at both basic science and applied levels.
Diffusion in Solids: Recent Developments provides an overview of diffusion in crystalline solids. This book discusses the various aspects of the theory of diffusion. Organized into nine chapters, this volume starts with a discussion on the process of diffusion in solids. This book then examines the tools that supplement the conventional diffusion measurements, including electromigration, ionic conductivity, isotope effects, and vacancy wind effects. This text explores the molecular dynamic calculation by which the interatomic forces must be assumed. Other chapters discuss the method of measurement of the isotope effect on diffusion, which is the most powerful method of determining relevant information about the correlation factor. This volume extensively discusses diffusion in organic and amorphous materials, as well as interstitial diffusion in solids. The final chapter deals with ionic motion and diffusion in various groups of materials called fast ionic conductors. Solid-state physicists, materials scientists, physical chemists, and electrochemists will find this book extremely useful.
In this book basic and some more advanced thermodynamics and phase as well as stability diagrams relevant for diffusion studies are introduced. Following, Fick’s laws of diffusion, atomic mechanisms, interdiffusion, intrinsic diffusion, tracer diffusion and the Kirkendall effect are discussed. Short circuit diffusion is explained in detail with an emphasis on grain boundary diffusion. Recent advances in the area of interdiffusion will be introduced. Interdiffusion in multi-component systems is also explained. Many practical examples will be given, such that researches working in this area can learn the practical evaluation of various diffusion parameters from experimental results. Large number of illustrations and experimental results are used to explain the subject. This book will be appealing for students, academicians, engineers and researchers in academic institutions, industry research and development laboratories.
This book describes the central aspects of diffusion in solids, and goes on to provide easy access to important information about diffusion in metals, alloys, semiconductors, ion-conducting materials, glasses and nanomaterials. Coverage includes diffusion-controlled phenomena including ionic conduction, grain-boundary and dislocation pipe diffusion. This book will benefit graduate students in such disciplines as solid-state physics, physical metallurgy, materials science, and geophysics, as well as scientists in academic and industrial research laboratories.
Volume is indexed by Thomson Reuters BCI (WoS). The present topical volume presents a representative cross-section of some recent advances made in the area of diffusion. The range of topics covered is very large, and, this reflects the enormous breadth of the topic of diffusion. The areas covered include diffusion in intermetallics, phenomenological diffusion theory, diffusional creep, kinetics of steel-making, diffusion in thin films, precipitation, diffusional phase transformations, atomistic diffusion simulations, epitaxial growth and diffusion in porous media.
With the increasing role of porous solids in conventional and newly emerging technologies, there is an urgent need for a deeper understanding of fluid behaviour confined to pore spaces of these materials especially with regard to their transport properties. From its early years, NMR has been recognized as a powerful experimental technique enabling direct access to this information. In the last two decades, the methodological development of different NMR techniques to assess dynamic properties of adsorbed ensembles has been progressed. This book will report on these recent advances and look at new broader applications in engineering and medicine. Having both academic and industrial relevance, this unique reference will be for specialists working in the research areas and for advanced graduate and postgraduate studies who want information on the versatility of diffusion NMR.
Handbook of Solid State Diffusion, Volume 2: Diffusion Analysis in Material Applications covers the basic fundamentals, techniques, applications, and latest developments in the area of solid-state diffusion, offering a pedagogical understanding for students, academicians, and development engineers. Both experimental techniques and computational methods find equal importance in the second of this two volume set. Volume 2 covers practical issues on diffusion phenomena in bulk, thin film, and in nanomaterials. Diffusion related problems and analysis of methods in industrial applications, such as electronic industry, high temperature materials, nuclear materials, and superconductor materials are discussed. - Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis - Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion - Covers bulk, thin film, and nanomaterials - Introduces the problems and analysis in important materials systems in various applications - Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe
Atomic transport in solids is a field of growing importance in solid state physics and chemistry, and one which, moreover, has important implications in several areas of materials science. This growth is due first to an increase in the understanding of the fund amentals of transport processes in solids. Of equal importance, however, have been the improvements in the last decade in the experi mental techniques available for the investigation of transport phenomena. The advances in technique have stimulated studies of a wider range of materials; and expansion of the field has been strong ly encouraged by the increasing range of applied areas where transport processes play an essential role. For example, mass transport phenomena play a critical role in the technology of fabrication of components in the electronics industry. Transport processes are involved both during the fabrication and operation of devices and with the growing trend to miniaturisation there are increasing demands on accurate control of diffusion processes. The present book (which is based on a NATO sponsored Advanced Study Institute held in 1981 at Lannion, France) aims to present a general survey of the subject, highlighting those areas where work has been especially active in recent years.