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Smirnov (plasma chemistry, Institute of High Temperatures, Moscow) presents a comprehensive introduction to cluster ions and Van der Waals molecules for graduates and researchers in chemistry. He discusses the current ideas on the operant physics and chemistry, and reports numerical data on the parameters of the entities and processes involving them. First published in Russian in 1983. Annotation copyrighted by Book News, Inc., Portland, OR
Explores the impact of the latest breakthroughs in cluster SIMS technology Cluster secondary ion mass spectrometry (SIMS) is a high spatial resolution imaging mass spectrometry technique, which can be used to characterize the three-dimensional chemical structure in complex organic and molecular systems. It works by using a cluster ion source to sputter desorb material from a solid sample surface. Prior to the advent of the cluster source, SIMS was severely limited in its ability to characterize soft samples as a result of damage from the atomic source. Molecular samples were essentially destroyed during analysis, limiting the method's sensitivity and precluding compositional depth profiling. The use of new and emerging cluster ion beam technologies has all but eliminated these limitations, enabling researchers to enter into new fields once considered unattainable by the SIMS method. With contributions from leading mass spectrometry researchers around the world, Cluster Secondary Ion Mass Spectrometry: Principles and Applications describes the latest breakthroughs in instrumentation, and addresses best practices in cluster SIMS analysis. It serves as a compendium of knowledge on organic and polymeric surface and in-depth characterization using cluster ion beams. It covers topics ranging from the fundamentals and theory of cluster SIMS, to the important chemistries behind the success of the technique, as well as the wide-ranging applications of the technology. Examples of subjects covered include: Cluster SIMS theory and modeling Cluster ion source types and performance expectations Cluster ion beams for surface analysis experiments Molecular depth profiling and 3-D analysis with cluster ion beams Specialty applications ranging from biological samples analysis to semiconductors/metals analysis Future challenges and prospects for cluster SIMS This book is intended to benefit any scientist, ranging from beginning to advanced in level, with plenty of figures to help better understand complex concepts and processes. In addition, each chapter ends with a detailed reference set to the primary literature, facilitating further research into individual topics where desired. Cluster Secondary Ion Mass Spectrometry: Principles and Applications is a must-have read for any researcher in the surface analysis and/or imaging mass spectrometry fields.
Positive ion composition measurements obtained with rocket-borne mass spectrometers in the lower ionosphere are presented. The current situation regarding the water cluster ions in the D region is considered. Evidence is given in favor of an ambient instead of a contamination origin for the water cluster ions, although the exact processes for the formation of these ions in the atmosphere are still not definitely established. A theory is discussed whereby water cluster ions may be created through the ionization of small water conglomerates, which are assumed both to be present in the mesosphere and to have very low ionization thresholds. (Author).
This book attempts to answer why there is so much interest in clusters. Clusters occur on all length scales, and as a result occur in a variety of fields. Clusters are interesting scientifically, but they also have important consequences technologically. The division of the book into three parts roughly separates the field into small, intermediate, and large-scale clusters. Small clusters are the regime of atomic and molecular physics and chemistry. The intermediate regime is the transitional regime, with its characteristics including the onset of bulk-like behavior, growth and aggregation, and the beginning of materials properties. Large-scale clusters reflect more condensed-matter and materials science aspects and it is in this regime that fractals make their most dramatic appearance. This well-integrated and pedagogical overview of the wide field of clusters in which both theoretical and experimental work is covered, will be of interest not only to students, advanced undergraduates and graduate students, but also to researchers in the various subfields surveyed.
Recent advances in experimental techniques now enable researchers to produce in a laboratory clusters of atoms of desired composition from any of the elements of the periodic table. This has created a new area of research into novel materials since clusters cannot be regarded either as a "large" molecule or as a fragment of the bulk. Both experimental and theoretical studies are revealing unusual properties that are not ob served in solid state environments. The structures of micro-clusters are found to be significantly distorted from the most symmetric arrangement, some even exhibiting pentagonal symmetry commonly found in icosahedric structures. The unusual stability of certain clusters, now described as "magic number species", shows striking similarities with the nuclear shell structure. The relative stabilities of clusters depend not only on the composition of the clusters but also on their charged states. The studies on spontaneous fragmentation of mUltiply charged clusters, commonly referred to as Coulomb explosion, illustrate the role of electronic bonding mechanisms on stability of clusters. The effect of foreign atoms on geometry and stability of clusters and the interaction of gas atoms with clusters are showing promise for an indepth understanding of chemisorption and catalysis. The magnetic and optical properties are dependent not only on cluster size but also on its geometry. These findings have the potential for aiding industry in the area of micro-electronics and catalysis.
This book covers important new developments of the last five years in the area of cluster chemistry, presenting an excellent view of the successes and shortcomings of both current state-of-the-art theory and experiment. Each chapter, contributed by a leading expert, places heavy emphasis on theory without which the detailed analysis of the spectroscopic and kinetic results would be compromised. The cluster reactions reviewed in this work include electron and proton transfer reactions, hot atom reactions, vibrational predissociation, radical reactions, and ionic reactions. Some of the theories applied throughout the text are product state distribution determinations, state-to-state dynamical information, and access to the transition stage of the reaction. The discussions serve as a benchmark of how far the field has come since the mid 1980's and will be a good update for students and researchers interested in this area of physical chemistry.
The present work explores the reactivities of gaseous vanadium, vanadium-oxide, and oxovanadium-hydroxide clusters toward methanol and small hydrocarbons. Various means of mass-spectrometric techniques, isotopic labeling studies, infrared photodissociation spectroscopy, and complementary DFT-calculations are employed for this purpose. Additionally, the hydrogen-atom abstraction process from methane by polynuclear metal oxides is discussed. This work contributes to a better understanding of the metal-oxide cluster's catalytic activity on a molecular scale.
This volume contains the proceedings of the Fifth International Confer ence on Secondary Ion Mass Spectrometry (SIMS V), held at the Capitol Holiday Inn, Washington, DC, USA, from September 30 to October 4, 1985. The conference was the fifth in a series of conferences held bienni ally. Previous conferences were held in Miinster (1977), Stanford (1979), Budapest (1981), and Osaka (1983). SIMS V was organized by Dr. R.J. Colton of the Nayal Research Lab oratory and Dr. D.S. Simons of the National Bureau of Standards un der the auspices of the International Organizing Committee chaired by Prof. A. Benninghoven of the Universitat Miinster. Dr. Richard F.K. Herzog served as the honorary chairman of SIMS V. While Dr. Herzog is best known to the mass spectrometry community for his theoretical development of a mass spectrometer design, known as the Mattauch-Herzog geometry, he also made several early and impor tant contributions to SIMS. In 1949, Herzog and Viehbock published a description of the first instrument designed to study secondary ions pro duced by bombardment from a beam of ions generated in a source that was separated from the sample by a narrow tube. Later at the GCA Cor poration, he brought together a team of researchers including H.J. Liebl, F.G. Riidenauer, W.P. Poschenrieder and F.G. Satkiewicz, who designed and built, and carried out applied research with the first commercial ion microprobe.
This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.