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This book reviews the major progress made in the fields of atomic, molecular and optical physics in the last decade. It contains eleven chapters in which contributors have highlighted the major accomplishments made in a given subfield. Each chapter is not a comprehensive review, but rather a succinct survey of the most interesting developments achieved in recent years. This book contains information on many AMO subfields and can be used as a textbook for graduate students interested in entering AMO physics. It may also serve researchers who wish to familiarize themselves with other AMO subfields.
Commencing with a self-contained overview of atomic collision theory, this monograph presents recent developments of R-matrix theory and its applications to a wide-range of atomic molecular and optical processes. These developments include the electron and photon collisions with atoms, ions and molecules which are required in the analysis of laboratory and astrophysical plasmas, multiphoton processes required in the analysis of superintense laser interactions with atoms and molecules and positron collisions with atoms and molecules required in antimatter studies of scientific and technologial importance. Basic mathematical results and general and widely used R-matrix computer programs are summarized in the appendices.
This is the first book to bring together both the basic theory and proven process engineering practice of AFM. It is presented in a way that is accessible and valuable to practising engineers as well as to those who are improving their AFM skills and knowledge, and to researchers who are developing new products and solutions using AFM. The book takes a rigorous and practical approach that ensures it is directly applicable to process engineering problems. Fundamentals and techniques are concisely described, while specific benefits for process engineering are clearly defined and illustrated. Key content includes: particle-particle, and particle-bubble interactions; characterization of membrane surfaces; the development of fouling resistant membranes; nanoscale pharmaceutical analysis; nanoengineering for cellular sensing; polymers on surfaces; micro and nanoscale rheometry. - Atomic force microscopy (AFM) is an important tool for process engineers and scientists as it enables improved processes and products - The only book dealing with the theory and practical applications of atomic force microscopy in process engineering - Provides best-practice guidance and experience on using AFM for process and product improvement
The book is a comprehensive edition which considers the interactions of atoms, ions and molecules with charged particles, photons and laser fields and reflects the present understanding of atomic processes such as electron capture, target and projectile ionisation, photoabsorption and others occurring in most of laboratory and astrophysical plasma sources including many-photon and many-electron processes. The material consists of selected papers written by leading scientists in various fields.
Atom-Photon Interactions: Basic Processes and Applications allows the reader to master various aspects of the physics of the interaction between light and matter. It is devoted to the study of the interactions between photons and atoms in atomic and molecular physics, quantum optics, and laser physics. The elementary processes in which photons are emitted, absorbed, scattered, or exchanged between atoms are treated in detail and described using diagrammatic representation. The book presents different theoretical approaches, including: Perturbative methods The resolvent method Use of the master equation The Langevin equation The optical Bloch equations The dressed-atom approach Each method is presented in a self-contained manner so that it may be studied independently. Many applications of these approaches to simple and important physical phenomena are given to illustrate the potential and limitations of each method.
This book provides the fundamental statistical theory of atomic transport in crystalline solids, that is the means by which processes occurring at the atomic level are related to macroscopic transport coefficients and other observable quantities. The cornerstones of the authors' treatment are (i) the physical concepts of lattice defects, (ii) the phenomenological description provided by non-equilibrium thermodynamics and (iii) the various methods of statistical mechanics used to link these (kinetic theory, random-walk theory, linear response theory etc.). The book is primarily concerned with transport in the body of crystal lattices and not with transport on surfaces, within grain boundaries or along dislocations, although much of the theory here presented can be applied to these low-dimensional structures when they are atomically well ordered and regular.
This book is devoted to the calculation of hot-plasma properties which generally requires a huge number of atomic data. It is the first book that combines information on the details of the basic atomic physics and its application to atomic spectroscopy with the use of the relevant statistical approaches. Information like energy levels, radiative rates, collisional and radiative cross-sections, etc., must be included in equilibrium or non-equilibrium models in order to describe both the atomic-population kinetics and the radiative properties. From the very large number of levels and transitions involved in complex ions, some statistical (global) properties emerge. The book presents a coherent set of concepts and compact formulas suitable for tractable and accurate calculations. The topics addressed are: radiative emission and absorption, and a dozen of other collisional and radiative processes; transition arrays between level ensembles (configurations, superconfigurations); effective temperatures of configurations, superconfigurations, and ions; charge-state distributions; radiative power losses and opacity. There are many numerical examples and comparisons with experiment presented throughout the book. The plasma properties described in this book are especially relevant to large nuclear fusion facilities such as the NIF (California) and the ITER (France), and to astrophysics. Methods relevant to the central-field configurational model are described in detail in the appendices: tensor-operator techniques, second-quantization formalism, statistical distribution moments, and the algebra of partition functions. Some extra tools are propensity laws, correlations, and fractals. These methods are applied to the analytical derivation of many properties, specially the global ones, through which the complexity is much reduced. The book is intended for graduate-level students, and for physicists working in the field.
In Megawatts and Megatons, world-renowned physicists Richard L. Garwin and Georges Charpak offer an accessible, eminently well-informed primer on two of the most important issues of our time: nuclear weapons and nuclear power. They begin by explaining clearly and concisely how nuclear fission and fusion work in both warheads and reactors, and how they can impact human health. Making a strong and eloquent argument in favor of arms control, Garwin and Charpak outline specific strategies for achieving this goal worldwide. But they also demonstrate how nuclear power can provide an assured, economically feasible, and environmentally responsible source of energy—in a way that avoids the hazards of weapons proliferation. Numerous figures enliven the text, including cartoons by Sempé.
Metallic films play an important role in modern technologies such as integrated circuits, information storage, displays, sensors, and coatings. Metallic Films for Electronic, Optical and Magnetic Applications reviews the structure, processing and properties of metallic films. Part one explores the structure of metallic films using characterization methods such as x-ray diffraction and transmission electron microscopy. This part also encompasses the processing of metallic films, including structure formation during deposition and post-deposition reactions and phase transformations. Chapters in part two focus on the properties of metallic films, including mechanical, electrical, magnetic, optical, and thermal properties. Metallic Films for Electronic, Optical and Magnetic Applications is a technical resource for electronics components manufacturers, scientists, and engineers working in the semiconductor industry, product developers of sensors, displays, and other optoelectronic devices, and academics working in the field. - Explores the structure of metallic films using characterization methods such as x-ray diffraction and transmission electron microscopy - Discusses processing of metallic films, including structure formation during deposition and post-deposition reactions and phase transformations - Focuses on the properties of metallic films, including mechanical, electrical, magnetic, optical, and thermal properties