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Treatise on Materials Science and Technology, Volume 30: Auger Electron Spectroscopy examines Auger electron spectroscopy and its various uses, emphasizing both theoretical and experimental studies. This book discusses the historical development of auger electron spectroscopy, studies of surface segregation kinetics by auger electron spectroscopy, and local electronic structure information in auger electron spectroscopy. The metallurgical applications of auger electron spectroscopy and auger photoelectron coincidence spectroscopy are also elaborated. Other topics include the measurement of surface segregation kinetics by Auger electron spectroscopy, tempered martensite embrittlement, embrittlement of nonferrous alloys, and analysis of particle-matrix interfaces. The high-resolution scanning Auger electron spectroscopy, corrosion and stress corrosion cracking, and APECS instrumentation are likewise covered in this publication. This volume is suitable for researchers and electrical engineering students conducting work on Auger electron spectroscopy.
Auger electron spectroscopy was used to examine surface segregation in the binary alloys copper-1 at. % indium, copper-2 at. % tin and iron-6.55 at. % silicon. The copper-tin and copper-indium alloys were single crystals oriented with the /111/ direction normal to the surface. An iron-6.5 at. % silicon alloy was studied (a single crystal oriented in the /100/ direction for study of a (100) surface). It was found that surface segregation occurred following sputtering in all cases. Only the iron-silicon single crystal alloy exhibited equilibrium segregation (i.e., reversibility of surface concentration with temperature) for which at present we have no explanation. McLean's analysis for equilibrium segregation at grain boundaries did not apply to the present results, despite the successful application to dilute copper-aluminum alloys. The relation of solute atomic size and solubility to surface segregation is discussed. Estimates of the depth of segregation in the copper-tin alloy indicate that it is of the order of a monolayer surface film.
Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.
The aim of this text is to present the background, the important concepts, and tabulated data of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) in a practical context for those involved in applied surface analysis techniques.
Surface analysis--the examination of the outer few nanometers of a material--is a routine undertaking in laboratories throughout the world, and is of great importance in such areas as corrosion, adhesion, polymer surface treatment, and microelectronics fabrication. This handbook provides an introduction to the two most popular surface analysis techniques: X-ray photoelectron spectroscopy and Auger electron spectroscopy. It explains the underlying physical principles, discusses instrumentation, and looks at the interpretation of resulting spectra. Applications of the two techniques are considered, and a critical comparison with other available methods is also included. This fully illustrated guide will be a valuable introduction for students and researchers in physics, engineering, and materials science.