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There are many cleaning techniques that are presently being employed for surface preparation of materials that are subsequently exposed to ultrahigh vacuum (UHV). Unfortunately, there are virtually no comparative measurements which establish the residual contaminant level of each method. In this report, eleven different cleaning methods, ranging from only detergent cleaning to electrochemical polishing, were applied to identical samples of 347 stainless steel. Two surface conditions, a standard machined surface and a mechanically polished surface, were studied. Auger electron spectroscopy (AES) within a UHV environment was then used to detect the types of contaminants and the magnitudes found on the sample surfaces. It was found that the electrochemical polishing gave the least contaminated surface of all metals studied and that mechanically polished surfaces were significantly cleaner than the as-machined surfaces for any given cleaning method. Furthermore, it was also found that the residual contaminations left by methanol, ethanol, isopropyl alcohol, acetone, and freon finishing rinses are almost the same. Wu, D. and Stephens, R. M. and Outlaw, R. A. and Hopson, P. Langley Research Center NASA-TP-2972, L-16653, NAS 1.60:2972 RTOP 763-01-41-53...
Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.
February issue includes Appendix entitled Directory of United States Government periodicals and subscription publications; September issue includes List of depository libraries; June and December issues include semiannual index
This book emphasises both experimental and theoretical aspects of surface, interface and thin-film physics. As in previous editions the preparation of surfaces and thin films, their atomic and morphological structure, their vibronic and electronic properties as well as fundamentals of adsorption are treated. Because of their importance in modern information technology and nanostructure research, particular emphasis is paid to electronic surface and interface states, semiconductor space charge layers and heterostructures. A special chapter of the book is devoted to collective phenomena at interfaces and in thin films such as superconductivity and magnetism. The latter topic includes the meanwhile important issues giant magnetoresistance and spin-transfer torque mechanism, both effects being of high interest in information technology. In this new edition, for the first time, the effect of spin-orbit coupling on surface states is treated. In this context the class of the recently detected topological insulators, materials of significant importance for spin electronics, are discussed. Particular emphasis, hereby, is laid on the new type of topologically protected surface states with well-defined spin orientation. Furthermore, some important well established experimental techniques such as X-ray diffraction (XRD) and reflection anisotropy spectroscopy (RAS), which were missing so far in earlier editions, were added in this new 6th edition of the book.