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Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
With topics ranging from epitaxy through lattice defects and doping to quantum computation, this book provides a personalized survey of the development and use of silicon, the basis for the revolutionary changes in our lives sometimes called "The Silicon Age." Beginning with the very first developments more than 50 years ago, this reports on all aspects of silicon and silicon technology up to its use in exciting new technologies, including a glance at possible future developments.
Research and development in modern optical and photonic technologies have witnessed quite fast growing advancements in various fundamental and application areas due to availability of novel fabrication and measurement techniques, advanced numerical simulation tools and methods, as well as due to the increasing practical demands. The recent advancements have also been accompanied by the appearance of various interdisciplinary topics. The book attempts to put together state-of-the-art research and development in optical and photonic technologies. It consists of 21 chapters that focus on interesting four topics of photonic crystals (first 5 chapters), THz techniques and applications (next 7 chapters), nanoscale optical techniques and applications (next 5 chapters), and optical trapping and manipulation (last 4 chapters), in which a fundamental theory, numerical simulation techniques, measurement techniques and methods, and various application examples are considered. This book deals with recent and advanced research results and comprehensive reviews on optical and photonic technologies covering the aforementioned topics. I believe that the advanced techniques and research described here may also be applicable to other contemporary research areas in optical and photonic technologies. Thus, I hope the readers will be inspired to start or to improve further their own research and technologies and to expand potential applications. I would like to express my sincere gratitude to all the authors for their outstanding contributions to this book.
This book addresses in an integrated manner all the critical aspects for building the next generation of biorecognition platforms - from biomolecular recognition to surface fabrication. The most recent strategies reported to create surface nano and micropatterns are thoroughly analyzed. This book contains descriptions of the types of molecules immobilized at surfaces that can be used for specific biorecognition, how to immobilize them, and how to control their arrangement and functionality at the surface. Small molecules, peptides, proteins and oligonucleotides are at the core of the biorecognition processes and will constitute a special part of this book. The authors include detailed information on biological processes, biomolecular screening, biosensing, diagnostic and detection devices, tissue engineering, development of biocompatible materials and biomedical devices.
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Provides a broad introduction to nanophysics and nanotechnologies, and the importance of low-dimensional and surface physics is discussed indepth. Chapters in Volume 1 covers the large range of physical preparation techniques available for the production of nanomaterials and nanostructuring.