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Good quality single crystals are the backbone of emerging technological world. There is a growing need to improve growth and characterization techniques and to grow high performance crystals for application purposes, Post growth treatments can enhance the
Crystals are the unacknowledged pillars of modern technology. The modern technological developments depend greatly on the availability of suitable single crystals, whether it is for lasers, semiconductors, magnetic devices, optical devices, superconductors, telecommunication, etc. In spite of great technological advancements in the recent years, we are still in the early stage with respect to the growth of several important crystals such as diamond, silicon carbide, PZT, gallium nitride, and so on. Unless the science of growing these crystals is understood precisely, it is impossible to grow them as large single crystals to be applied in modern industry. This book deals with almost all the modern crystal growth techniques that have been adopted, including appropriate case studies. Since there has been no other book published to cover the subject after the Handbook of Crystal Growth, Eds. DTJ Hurle, published during 1993-1995, this book will fill the existing gap for its readers. The book begins with "Growth Histories of Mineral Crystals" by the most senior expert in this field, Professor Ichiro Sunagawa. The next chapter reviews recent developments in the theory of crystal growth, which is equally important before moving on to actual techniques. After the first two fundamental chapters, the book covers other topics like the recent progress in quartz growth, diamond growth, silicon carbide single crystals, PZT crystals, nonlinear optical crystals, solid state laser crystals, gemstones, high melting oxides like lithium niobates, hydroxyapatite, GaAs by molecular beam epitaxy, superconducting crystals, morphology control, and more. For the first time, the crystal growth modeling has been discussed in detail with reference to PZT and SiC crystals.
This volume deals with the technologies of crystal fabrication, of crystal machining, and of epilayer production and is the first book on industrial and scientific aspects of crystal and layer production. The major industrial crystals are treated: Si, GaAs, GaP, InP, CdTe, sapphire, oxide and halide scintillator crystals, crystals for optical, piezoelectric and microwave applications and more. Contains 29 contributions from leading crystal technologists covering the following topics: * General aspects of crystal growth technology * Silicon * Compound semiconductors * Oxides and halides * Crystal machining * Epitaxy and layer deposition Scientific and technological problems of production and machining of industrial crystals are discussed by top experts, most of them from the major growth industries and crystal growth centers. In addition, it will be useful for the users of crystals, for teachers and graduate students in materials sciences, in electronic and other functional materials, chemical and metallurgical engineering, micro-and optoelectronics including nanotechnology, mechanical engineering and precision-machining, microtechnology, and in solid-state sciences.
This book presents recent advances and trends in photonic crystal technology, making it a useful resource for students, researchers, and faculty in the field. It consists of five chapters that present in-depth knowledge of numerical methods and different applications of photonic crystal technology. The chapters discuss photonic crystals for energy, sensing, and digital devices. They also examine advanced applications of photonic crystals, like holography and photonic spin hall effect. Each chapter presents a detailed background on the considered application, recent work in the area, possible solutions to challenges, and future aspects.
This book discusses the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production.
In this book, academic researchers and technologists will find important information on the interaction of polymeric and non-polymeric inhibitors with a variety of scale forming crystals such as calcium phosphates, calcium carbonate, calcium oxalates, barium sulfate, calcium pyrophosphates, and calcium phosphonates. Moreover, the book delivers information to plant managers and formulators who would like to broaden and deepen their knowledge about processes involved in precipitation of sparingly soluble salts and learn more about the inhibitory aspects of various commercially available materials. Furthermore, experienced researchers will obtain fruitful and inspiring ideas from the easily accessible information about overlapping research areas, which will promote discoveries of new inhibitors (synthetic and/or natural) for the currently unmet challenges.
The book contains 5 chapters with 19 contributions form internationally well acknowledged experts in various fields of crystal growth. The topics are ranging from fundamentals (thermodynamic of epitaxy growth, kinetics, morphology, modeling) to new crystal materials (carbon nanocrystals and nanotubes, biological crystals), to technology (Silicon Czochralski growth, oxide growth, III-IV epitaxy) and characterization (point defects, X-ray imaging, in-situ STM). It covers the treatment of bulk growth as well as epitaxy by anorganic and organic materials.
This book features up-to-date technology applications to radiation detection. It synthesises several techniques of and approaches to radiation detection, covering a wide range of applications and addressing a large audience of experts and students. Many of the talks are in fact reviews of particular topics often not covered in standard books and other conferences, for instance, the medical physics section. To present these medical physics talks is crucial, since a large fraction of the community in medical physics are from the particle physics community. The same feature is true for astroparticle and space physics, which are relatively new fields. This book is unique in its scope. Except for IEEE, there is no other conference in the world that presents such a wide coverage of advanced technology applied to particle physics. However, unlike IEEE, more room is made in the book for reviews and general talks.
Over the years, many successful attempts have been chapters in this part describe the well-known processes made to describe the art and science of crystal growth, such as Czochralski, Kyropoulos, Bridgman, and o- and many review articles, monographs, symposium v- ing zone, and focus speci cally on recent advances in umes, and handbooks have been published to present improving these methodologies such as application of comprehensive reviews of the advances made in this magnetic elds, orientation of the growth axis, intro- eld. These publications are testament to the grow- duction of a pedestal, and shaped growth. They also ing interest in both bulk and thin- lm crystals because cover a wide range of materials from silicon and III–V of their electronic, optical, mechanical, microstructural, compounds to oxides and uorides. and other properties, and their diverse scienti c and The third part, Part C of the book, focuses on - technological applications. Indeed, most modern ad- lution growth. The various aspects of hydrothermal vances in semiconductor and optical devices would growth are discussed in two chapters, while three other not have been possible without the development of chapters present an overview of the nonlinear and laser many elemental, binary, ternary, and other compound crystals, KTP and KDP. The knowledge on the effect of crystals of varying properties and large sizes. The gravity on solution growth is presented through a c- literature devoted to basic understanding of growth parison of growth on Earth versus in a microgravity mechanisms, defect formation, and growth processes environment.