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Developments in lasers continue to enable progress in many areas such as eye surgery, the recording industry and dozens of others. This book presents citations from the book literature for the last 25 years and groups them for ease of access which is also provided by subject, author and titles indexes.
Advances in Laser Materials Processing: Technology, Research and Application, Second Edition, provides a revised, updated and expanded overview of the area, covering fundamental theory, technology and methods, traditional and emerging applications and potential future directions. The book begins with an overview of the technology and challenges to applying the technology in manufacturing. Parts Two thru Seven focus on essential techniques and process, including cutting, welding, annealing, hardening and peening, surface treatments, coating and materials deposition. The final part of the book considers the mathematical modeling and control of laser processes. Throughout, chapters review the scientific theory underpinning applications, offer full appraisals of the processes described and review potential future trends. - A comprehensive practitioner guide and reference work explaining state-of-the-art laser processing technologies in manufacturing and other disciplines - Explores challenges, potential, and future directions through the continuous development of new, application-specific lasers in materials processing - Provides revised, expanded and updated coverage
It is a great pleasure that we are now publishing the fourth volume of the series on PUILS, through which we have been introducing the progress in ultrafast intense laser science, the frontiers of which are rapidly expanding, thanks to the progress in ultrashort and high-power laser technologies. The interdisciplinary nature of this research ?eld is attracting researchers with di?erent expertise and backgrounds. As in the previousvolumeson PUILS, each chapter in the presentvolume, which is in the range of 15–25 pages, begins with an introduction in which a clear and concise account of the signi?cance of the topic is given, followed by a description of the authors’ most recent research results. All the chapters are peer-reviewed. The articles of this fourth volume cover a diverse range of the interdisciplinary research ?eld, and the topics may be grouped into four categories: strong ?eld ionization of atoms (Chaps. 1–2), excitation, ioni- tion and fragmentation of molecules (Chaps. 3–5), nonlinear intense optical phenomena and attosecond pulses (Chaps. 6–8), and laser solid interactions and photoemissions (Chaps. 9–11).
First multi-year cumulation covers six years: 1965-70.
This volume introduces the subject of laser ablation and desorption to scientists and engineers. It covers fundamental experimental and theoretical tools, models, and techniques, and introduces the most important applications. Clearly written and organized in a straightforward manner, Laser Ablation and Desorption lead the reader straight through the fundamentals of laser-surface interactions. Each chapter is self-contained and includes references to other chapters as necessary, so that readers may begin with the topic of greatest interest and follow the references to other aspects of the subject contained within the book.Key Features* Provides up-to-date information about one of the most active fields in physics today* Written and edited by major figures in the field of laser ablation and desorption* Represents the most comprehensive treatment of the state-of-the-art available
Presents various facets of laser surface treatment, emphasizing technologies that are expected to be important soon. The topics include fundamentals and types, surface texturing, heat treatment, metallic and intermetallic coating, the laser deposition of ceramic coatings, polymeric coatings, the cor
"Blurb & Contents" Culled from the thousands of papers published in American Institute of Physics Soviet Translation journals during 1987 and 1988, this reprint collection presents 91 of the Russia's finest papers on semiconductor physics and technology. In their selections, the editors were advised and assisted by leading experts in the field from both Russia and the United States, resulting in a collection objectively representing only the most important and enduring Russian contributions to semiconductor physics and technology.
This volume covers a broad range of topics focusing on atoms, molecules, and clusters interacting in intense laser field, laser induced filamentation, and laser plasma interaction and application. The PUILS series delivers up-to-date reviews of progress in Ultrafast Intense Laser Science, a newly emerging interdisciplinary research field spanning atomic and molecular physics, molecular science, and optical science, which has been stimulated by the recent developments in ultrafast laser technologies. Each volume compiles peer-reviewed articles authored by researchers at the forefront of each their own subfields of UILS. Every chapter opens with an overview of the topics to be discussed, so that researchers unfamiliar to the subfield, as well as graduate students, can grasp the importance and attractions of the research topic at hand; these are followed by reports of cutting-edge discoveries.